JPH01174920U - - Google Patents

Info

Publication number
JPH01174920U
JPH01174920U JP7155188U JP7155188U JPH01174920U JP H01174920 U JPH01174920 U JP H01174920U JP 7155188 U JP7155188 U JP 7155188U JP 7155188 U JP7155188 U JP 7155188U JP H01174920 U JPH01174920 U JP H01174920U
Authority
JP
Japan
Prior art keywords
substrate
surface treatment
transfer mechanism
direction changing
changing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7155188U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7155188U priority Critical patent/JPH01174920U/ja
Publication of JPH01174920U publication Critical patent/JPH01174920U/ja
Pending legal-status Critical Current

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  • Weting (AREA)
JP7155188U 1988-05-30 1988-05-30 Pending JPH01174920U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7155188U JPH01174920U (en]) 1988-05-30 1988-05-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7155188U JPH01174920U (en]) 1988-05-30 1988-05-30

Publications (1)

Publication Number Publication Date
JPH01174920U true JPH01174920U (en]) 1989-12-13

Family

ID=31296757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7155188U Pending JPH01174920U (en]) 1988-05-30 1988-05-30

Country Status (1)

Country Link
JP (1) JPH01174920U (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001230299A (ja) * 2000-02-18 2001-08-24 Sumitomo Precision Prod Co Ltd 基板処理設備
JP2010182755A (ja) * 2009-02-03 2010-08-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001230299A (ja) * 2000-02-18 2001-08-24 Sumitomo Precision Prod Co Ltd 基板処理設備
JP2010182755A (ja) * 2009-02-03 2010-08-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法

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